Argonne National Laboratory Center for Nanoscale Materials U.S. Department of Energy

2007 CNM Users Meeting

Please see the Users Meeting Week site for details regarding registration, deadlines, program, exhibits, lodging, and travel.

Wednesday, May 9, 2007
7:00-10:00 p.m. Joint User Facilities Banquet
Thursday, May 10, 2007
9:00 a.m.-4:30 p.m.

Workshops

Workshop 8. Hard X-Ray Nanoprobe (CNM/APS)
Jörg Maser (CNM/APS), Brian Stephenson (MSD/CNM), Stephen Streiffer (CNM)

Workshop 9. Nanotomography (CNM/EMC/APS)
Derrick Mancini (CNM), Bernd Kabius (EMC), Mark Rivers (APS/UChicago)

Workshop 10. Synthesis and Self-Assembly of Nanomaterials (CNM)
Xiao-Min Lin (CNM), Moonsub Shim (UIUC)

Workshop 11. NanoElectronics (CNM)
Mark Eriksson (UW-Madison), Nikolai Zhitenev (Bell Labs)

Other User Meeting Workshops

4:30-6:30 p.m.

Poster Session and Reception
CNM Facility Tour (5:00-6:00 p.m.)

(All posters can be set up for the entire week in APS LOM 437.)

6:45 p.m. CNM Banquet
Argonne Guest House
Friday, May 11, 2007
(All events will be held in the APS 402 Lecture Hall)
Keynote Session
8:30-8:35 a.m. Welcome, Paul Evans, Chair, CNM Users' Executive Committee
8:35-8:45 a.m. Welcome from Argonne’s Directorate
Dr. Al Sattelberger
Associate Laboratory Director for Physical Sciences
Acting Associate Laboratory Director for Applied Sciences & Technology
8:45-9:30 a.m. Federal and DOE Perspectives on Nanoscience and Nanotechnology
Dr. Altaf H. Carim, Program Manager
Scientific User Facilities Division, DOE-BES
9:30-10:15 a.m. Center for Nanoscale Materials Update, Eric D. Isaacs
10:15-10:30 a.m. Break
10:30-11:15 a.m.

Nanomaterials in Energy Storage: Recent Achievements & Future Prospects
Prof. Yet-Ming Chiang, Kyocera Professor Ceramics
Dept. of Materials Science & Engineering
Massachusetts Institute of Technology

11:15 -12:00 noon Nanomaterials and Grand Challenges in Medicine
"Cancer Nanotechnology: An Opportunity for a New Class of Diagnostic and Therapeutic Solutions"
Dr. Larry Nagahara, Nanotechnology in Cancer, Office of the Director, National Cancer Institute
12:00 -1:15 p.m. Lunch
Plenary Session
1:15-1:50 p.m.

“Functionalized carbon nanostructures: Synthesis and applications in photovoltaics and biology,”
Dirk Guldi, Institute of Physical Chemistry
University of Erlangen-Nürnberg, Germany

1:50 - 2:25 p.m. “Temporally and Spatially Resolved Solar Energy Flow in 2D and 3D Photosynthetic Structures,”
Libai Huang, Center for Nanoscale Materials
Argonne National Laboratory
2:25 - 3:00 p.m. “Exciton-Exciton Interactions in Semiconductor Nanocrystals from the Perspective of Solar-Energy Conversion,”
Victor Klimov, Softmatter Nanotechnology and Advanced Spectroscopy Team
Los Alamos National Laboratory
3:00 - 3:15 p.m. Break
3:15 - 3:50 p.m. “Solid-State Lighting: Recent Advances and Current Challenges,” Anneli Munkholm, Phillips Lumileds Lighting Company
3:50 - 4:25 p.m.

“Manipulating Nanomagnets Using Spin-Transfer Torques,”
Daniel Ralph, Laboratory of Atomic and Solid-State Physics
Cornell University

4:25 - 5:00 p.m. "Quasi-Three-Dimensional Plasmonic Crystals,”
John Rogers, Department of Materials Science and Engineering
University of Illinois at Urbana-Champaign
5:00 - 5:15 p.m. Announcement of New CNM UEC Members, Paul Evans
Saturday, May 12, 2007
Short Courses (limited registration)
[registration for the User Meeting is required (either M-F or Th-F);
1/2-day sessions are repeated in the afternoon]

8:30 a.m.– 12:00 noon

Lunch: 12:00 – 1:00

1:00 – 4:30 p.m.

A. Electron-Beam Lithography for Beginning Users
For novice or potential users who have little or no hands-on experience, this course will concentrate on learning the Raith 150, 30 -kV electron lithography system. With an easy-to-follow Windows interface, this mid-sized tool can deliver 12-nm features. It also serves as our cleanroom scanning electron microscope.

B. Electron-Beam Lithography for Intermediate Users
For users with some hands-on experience, this course will concentrate on the advanced JEOL 9300 instrument. The JEOL9300FS 100-keV electron lithography system provides capability of reproducibly achieving feature sizes below 10 nm. This state-of-the-art tool has a 1-nm address grid over a complete 1-mm field size. Pattern placement errors are in the single-digit nanometers, and the system can handle samples from small pieces to 8-inch wafers.

C. Focused Ion Beams for Nanofabrication
Focused ion beam systems use a finely focused beam of gallium ions operated at low-beam currents for imaging and at high-beam currents for site-specific milling. Their versatility makes them popular for a wide variety of applications, including advanced circuit edititing and revealing below-the-surface defects in advanced materials and devices. This tool complements the two electron-beam tools.

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