The 52nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), held in Portland,
Oregon, in May 2008, sponsored a micrograph contest. An image supplied by Leo Ocola and Ralu Divan won the category of “Best
Photon Micrograph” with an optical micrograph of the first imprint from the CNM’s Nanofabrication Cleanroom Facility
made with their new step-and-repeat Nanonex NX-3000 Nanoimprinting tool.
The radial array was used for a silicon crystal anisotropic wet etching study. For micromachining applications that employ
silicon as the material, it is very useful to know the etching rate in all directions in order to be able to "build" different
shapes. With a radial mask, one is able to estimate the etching rate of all crystallographic directions. Upon aligning a design
with a specific direction, one can then etch pyramids, cubes, V-shaped grooves, and U-shaped grooves. The researchers used potassium
hydroxide base as the etching solution at high speeds.