Award-Winning Image

Alexandre Imre (staff scientist in the Nanofabrication & Devices Group) and CNM user Melike Abliz (Advanced Photon Source) have won the Best Photon Micrograph award at the 53rd International Conference on Electron, Ion, and Photon Beam Technology & Nanofabrication, held in Marco Island, Florida, in May 2009. The image is an optical micrograph of the culet of a brilliant-cut diamond that is covered with developed positive photoresist sporting the pattern of a future pickup coil.

June 2009